6.1 The MOS Capacitor - Introduction
Table of Contents - Glossary
- Study Aids
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In this section:
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Introduction
-
The MOS structure
Next: 6.2 MOS Energy band diagram
6.1.1 Introduction
The primary reason to study the MOS capacitor is to understand the principle
of operation as well as the detailed analysis of the MOSFET. In this chapter
we introduce the Metal-Oxide- Silicon (MOS) structure
and its four different modes of operation, namely accumulation, flatband,
depletion and inversion. We then consider the flatband
voltage in more detail and present the the exact
analytical solution which we use to discuss the issue of the inversion
layer charge and compare it to the simple MOS
capacitance model.
6.1.2 The MOS structure
The MOS capacitor consists of a Metal-Oxide-Semiconductor structure as
shown in the figure below. Electrical contacts are made to the metal gate
and the back contact to the semiconductor. Also shown is the charge distribution
in the structure under acccumulation, depletion and inversion conditions.
mos.gif
Fig.6.1.1 Charges in a Metal-Oxide-Semiconductor structure
under accumulation, depletion and inversion conditions
Accumulation occurs typically for negative voltages where the negative
charge on the gate attracts holes from the substrate to the oxide-semiconductor
interface. Depletion occurs for positive voltages; The positive
charge on the gate pushes the mobile holes into the substrate, thereby
depleting the semiconductor of the mobile carriers and leaving a negative
charge in the space charge region which is due to the ionized acceptor
ions. The voltage separating the accumulation and depletion regime is refered
to as the flatband voltage. Inversion occurs at more positive
voltages which are larger than the threshold voltage. In addition to the
depletion layer charge a negatively charged inversion layer forms at the
oxide-semiconductor interface.
6. ¬?®
6.2
© Bart J. Van Zeghbroeck, 1996, 1997